Follow Our FB Page << CircleMedia.in >> for Daily Laughter. We Post Funny, Viral, Comedy Videos, Memes, Vines...


loss on drying we applied vaccum for some compounds and
some compounds are at 105c why

Answers were Sorted based on User's Feedback



loss on drying we applied vaccum for some compounds and some compounds are at 105c why..

Answer / s jagadeesh chandra

Thermally liable compounds are dried in hot air oven.
Thermally un stable compounds are dried under vaccum.
Vaccum is applied to prevent sample loss due to
splashing,foming.Low boiling samples are dried under vaccum.

Is This Answer Correct ?    16 Yes 1 No

loss on drying we applied vaccum for some compounds and some compounds are at 105c why..

Answer / falguni

As per
PV=NRT, if we decrease pressure, temperature also decrease.
Vacuum i.e. no pressure. If we heat our sample which has
low melting point(near 60C), it melts at 60C. Vacuum lowers
the temprature but effect on sample is in equilibrum to the
higher temperature. It does not melt the sample but remove
volatile solvents and adsorbed water.

Is This Answer Correct ?    7 Yes 0 No

loss on drying we applied vaccum for some compounds and some compounds are at 105c why..

Answer / virender

In a Vacuum Oven, the thermal processes occur in an airtight
chamber where a desired level of vacuum has been applied
using an external vacuum pump (not included). With a vacuum
oven the entire application can take place under vacuum or a
controlled atmosphere can be created through the
introduction of an inert gas. Vacuum ovens can help in the
prevention of surface reactions (such as oxidation),
decontaminating samples (removing lubricants for example) as
well as for speeding up the out gassing process. When
determining the process you will use for a vacuum oven bear
in mind that you will need to size a pump to meet this
application. This requires defining the appropriate chamber
size, the level of vacuum desired, and how quickly you will
need to reach that desired vacuum level.

Is This Answer Correct ?    2 Yes 0 No

Post New Answer

More Analytical Chemistry Interview Questions

What is the diff b/n OVI and Residual solvents

1 Answers  


can we use the same detector in HPLC as well GC and what could be the differences we can find in the final chromato graph in any aspects?

0 Answers   Cipla, XYZ,


If combination product how require to identify which imp is of which api?

0 Answers  


WHY KBr is used in IR Spectroscopy

3 Answers   GVK,


why peak purity not considered in GC?

4 Answers   DRL, Reddy Labs, Vimta Labs,






Why pH range is maximum 14.0

6 Answers   UPL,


0.1 atom gram of the unknown element( X)reacts with 2.4 gram of O2 to produce the oxid product . can you tell us, what is the oxid formula ? a) XO b)X2O3 c)XO2 D) X2O4

1 Answers   Ajanta,


What is difference between the working standard and reference standard?

1 Answers  


Why caffeine as a reference standard used for calibration of HPLC?

11 Answers   Gangwal Chemicals, Orchid,


What is Formula of Potency calculation on Dried basis, As is basis& Anhydrous basis.

11 Answers   Laurus, Teva API,


From where 16 or 5.545 is derived in theoretical plates calculation formula by USP or JP/BP/DAB and what is meaning of this coefficient and impact in calculation ?

2 Answers   Nectar Lifesciences,


In HPLC Calibration, On which basis RSD Limit of noise test is fixed (NMT 33.0 % )

0 Answers   Alembic,


Categories
  • Organic Chemistry Interview Questions Organic Chemistry (302)
  • Inorganic Chemistry Interview Questions Inorganic Chemistry (123)
  • Analytical Chemistry Interview Questions Analytical Chemistry (1385)
  • Physical Chemistry Interview Questions Physical Chemistry (62)
  • General Chemistry Interview Questions General Chemistry (478)
  • Chemistry AllOther Interview Questions Chemistry AllOther (190)