Answer / Ajit Kumar

The SiO2 (silicon dioxide) layer in a monolithic IC is typically formed through thermal oxidation. This process involves exposing silicon to an oxidizing gas, such as oxygen or steam, at high temperatures. The silicon reacts with the oxygen to form a thin layer of SiO2.

How the E1 speed is calculated as2.048mbps.write the full procedure.

2 Answers   Ericsson,

---

Difference between electronic and electrical.

1 Answers  

---

plz tell me the syllabus for airport authority of india recruitment for the post of Jr. electronics engineer.let me know whether written test will be a aptitude test or technical??

2 Answers  

---

why we are using input resistance in op-amp. indicate the role of it.

1 Answers  

---

Explain why we need biasing for transistor, fet and mosfet?

1 Answers  

---

Why the current in power diode varies linearly rather than exponentially with voltage?

1 Answers  

---

What are the applications of demultiplexer?

1 Answers  

---

highest voltage gain can be obtained from a ).CC b).CE c).CB d).Both CE and CB

14 Answers   Cisco, Ericsson, SRC,

---

which kind of job we can get in usa after comlete electronics and telecommunication

1 Answers  

---

what is a GPIB?

2 Answers   BEL,

---

Define what is back diode?

1 Answers  

---

who invented c language?

14 Answers   Assurgent,

---